Direct resist-free patterning of an organic semiconductor via thermal scanning probe lithography
- DOI
- 10.1186/s11671-026-04658-8
- Published
- 2026-06-21
- Container
- Discover Nano
- Publisher
- Springer Science and Business Media LLC
- Open access
- unknown
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Cite this work
BibTeX
@article{allodium:10.1186/s11671-026-04658-8,
title = {Direct resist-free patterning of an organic semiconductor via thermal scanning probe lithography},
author = {Kaimin Luo and Jun Li and Yanshu Gu and Tianlei Ma and Jingyuan Zhang and Liying Cao and Zhaohui Zhu and Heng Tang and Pengcheng Xu and Hao Jia and Min Tu and Xinxin Li},
year = {2026},
journal = {Discover Nano},
doi = {10.1186/s11671-026-04658-8},
url = {https://doi.org/10.1186/s11671-026-04658-8}
}RIS
TY - JOUR TI - Direct resist-free patterning of an organic semiconductor via thermal scanning probe lithography AU - Kaimin Luo AU - Jun Li AU - Yanshu Gu AU - Tianlei Ma AU - Jingyuan Zhang AU - Liying Cao AU - Zhaohui Zhu AU - Heng Tang AU - Pengcheng Xu AU - Hao Jia AU - Min Tu AU - Xinxin Li PY - 2026 JO - Discover Nano DO - 10.1186/s11671-026-04658-8 UR - https://doi.org/10.1186/s11671-026-04658-8 ER -
APA
Luo, K., Li, J., Gu, Y., Ma, T., Zhang, J., Cao, L., Zhu, Z., Tang, H., Xu, P., Jia, H., Tu, M., & Li, X. (2026). Direct resist-free patterning of an organic semiconductor via thermal scanning probe lithography. Discover Nano. https://doi.org/10.1186/s11671-026-04658-8
Source records
- crossref · retrieved 2026-09-25T23:27:45.795Z