Nano-scale Al redistribution at grain boundaries governs growth morphology in β-(AlxGa1-x)2O3 on sapphire substrate via MOCVD
- DOI
- 10.1186/s11671-026-04753-w
- Published
- 2026-07-06
- Container
- Discover Nano
- Publisher
- Springer Science and Business Media LLC
- Open access
- unknown
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Cite this work
BibTeX
@article{allodium:10.1186/s11671-026-04753-w,
title = {Nano-scale Al redistribution at grain boundaries governs growth morphology in β-(AlxGa1-x)2O3 on sapphire substrate via MOCVD},
author = {Chih Yang Huang and Filip Gucmann and Anoop Kumar Singh and Po-Hsun Chen and Chien-Nan Hsiao and Edmund Dobročka and Milan Ťapajna and Igor Píš and Matej Mičušík and Siddharth Rana and Dong-Sing Wuu and Po-Liang Liu and Kenneth Järrendahl and Ching-Lien Hsiao and Ray-Hua Horng},
year = {2026},
journal = {Discover Nano},
doi = {10.1186/s11671-026-04753-w},
url = {https://doi.org/10.1186/s11671-026-04753-w}
}RIS
TY - JOUR TI - Nano-scale Al redistribution at grain boundaries governs growth morphology in β-(AlxGa1-x)2O3 on sapphire substrate via MOCVD AU - Chih Yang Huang AU - Filip Gucmann AU - Anoop Kumar Singh AU - Po-Hsun Chen AU - Chien-Nan Hsiao AU - Edmund Dobročka AU - Milan Ťapajna AU - Igor Píš AU - Matej Mičušík AU - Siddharth Rana AU - Dong-Sing Wuu AU - Po-Liang Liu AU - Kenneth Järrendahl AU - Ching-Lien Hsiao AU - Ray-Hua Horng PY - 2026 JO - Discover Nano DO - 10.1186/s11671-026-04753-w UR - https://doi.org/10.1186/s11671-026-04753-w ER -
APA
Huang, C. Y., Gucmann, F., Singh, A. K., Chen, P., Hsiao, C., Dobročka, E., Ťapajna, M., Píš, I., Mičušík, M., Rana, S., Wuu, D., Liu, P., Järrendahl, K., Hsiao, C., & Horng, R. (2026). Nano-scale Al redistribution at grain boundaries governs growth morphology in β-(AlxGa1-x)2O3 on sapphire substrate via MOCVD. Discover Nano. https://doi.org/10.1186/s11671-026-04753-w
Source records
- crossref · retrieved 2026-09-26T20:23:10.975Z