Nanoimprint lithography for scalable electronic and photonic nanomanufacturing.

Chen PT, Huang CC, Lai YW, Lin CH, Lee KY, Li CC, Chang CT, Tsai CJ, Chen LY, Lee PT, Hong YH, Lee TY, Kuo HC

DOI: 10.1186/s11671-026-04870-6
Published: 2026 Sep 21
Container: Discover nano
Publisher: Not recorded
Open access: yes

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Cite this work

BibTeX

@article{allodium:10.1186/s11671-026-04870-6,
  title = {Nanoimprint lithography for scalable electronic and photonic nanomanufacturing.},
  author = {Chen PT and Huang CC and Lai YW and Lin CH and Lee KY and Li CC and Chang CT and Tsai CJ and Chen LY and Lee PT and Hong YH and Lee TY and Kuo HC},
  year = {2026},
  journal = {Discover nano},
  doi = {10.1186/s11671-026-04870-6},
  url = {https://doi.org/10.1186/s11671-026-04870-6}
}

RIS

TY  - JOUR
TI  - Nanoimprint lithography for scalable electronic and photonic nanomanufacturing.
AU  - Chen PT
AU  - Huang CC
AU  - Lai YW
AU  - Lin CH
AU  - Lee KY
AU  - Li CC
AU  - Chang CT
AU  - Tsai CJ
AU  - Chen LY
AU  - Lee PT
AU  - Hong YH
AU  - Lee TY
AU  - Kuo HC
PY  - 2026
JO  - Discover nano
DO  - 10.1186/s11671-026-04870-6
UR  - https://doi.org/10.1186/s11671-026-04870-6
ER  -

APA

PT, C., CC, H., YW, L., CH, L., KY, L., CC, L., CT, C., CJ, T., LY, C., PT, L., YH, H., TY, L., & HC, K. (2026). Nanoimprint lithography for scalable electronic and photonic nanomanufacturing.. Discover nano. https://doi.org/10.1186/s11671-026-04870-6

Source records

pubmed · retrieved 2026-11-10T13:49:02.375Z