Negligible impact of UV-curable resist shrinkage on NIL pattern fidelity.

Yang G, Cao X, Wang J, Chen J, Chen R, Xu B, Wang X, Chen X, Deng M, Hao Z, Cui Y, Ge H

DOI: 10.1186/s11671-026-04906-x
Published: 2026 Oct 16
Container: Discover nano
Publisher: Not recorded
Open access: yes

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Cite this work

BibTeX

@article{allodium:10.1186/s11671-026-04906-x,
  title = {Negligible impact of UV-curable resist shrinkage on NIL pattern fidelity.},
  author = {Yang G and Cao X and Wang J and Chen J and Chen R and Xu B and Wang X and Chen X and Deng M and Hao Z and Cui Y and Ge H},
  year = {2026},
  journal = {Discover nano},
  doi = {10.1186/s11671-026-04906-x},
  url = {https://doi.org/10.1186/s11671-026-04906-x}
}

RIS

TY  - JOUR
TI  - Negligible impact of UV-curable resist shrinkage on NIL pattern fidelity.
AU  - Yang G
AU  - Cao X
AU  - Wang J
AU  - Chen J
AU  - Chen R
AU  - Xu B
AU  - Wang X
AU  - Chen X
AU  - Deng M
AU  - Hao Z
AU  - Cui Y
AU  - Ge H
PY  - 2026
JO  - Discover nano
DO  - 10.1186/s11671-026-04906-x
UR  - https://doi.org/10.1186/s11671-026-04906-x
ER  -

APA

G, Y., X, C., J, W., J, C., R, C., B, X., X, W., X, C., M, D., Z, H., Y, C., & H, G. (2026). Negligible impact of UV-curable resist shrinkage on NIL pattern fidelity.. Discover nano. https://doi.org/10.1186/s11671-026-04906-x

Source records

pubmed · retrieved 2026-11-10T13:52:38.660Z