A comparative study of air cushion and roll-to-plate pressing in wafer-level nanoimprint lithography
- DOI
- 10.1186/s11671-026-04958-z
- Published
- 2026-09-28
- Container
- Discover Nano
- Publisher
- Springer Science and Business Media LLC
- Open access
- unknown
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Cite this work
BibTeX
@article{allodium:10.1186/s11671-026-04958-z,
title = {A comparative study of air cushion and roll-to-plate pressing in wafer-level nanoimprint lithography},
author = {Guiyan Yang and Si Chen and Bo Xu and Mengmeng Deng and Xinyu Wang and Xiaofeng Chen and Zongbin Hao and Haixiong Ge},
year = {2026},
journal = {Discover Nano},
doi = {10.1186/s11671-026-04958-z},
url = {https://doi.org/10.1186/s11671-026-04958-z}
}RIS
TY - JOUR TI - A comparative study of air cushion and roll-to-plate pressing in wafer-level nanoimprint lithography AU - Guiyan Yang AU - Si Chen AU - Bo Xu AU - Mengmeng Deng AU - Xinyu Wang AU - Xiaofeng Chen AU - Zongbin Hao AU - Haixiong Ge PY - 2026 JO - Discover Nano DO - 10.1186/s11671-026-04958-z UR - https://doi.org/10.1186/s11671-026-04958-z ER -
APA
Yang, G., Chen, S., Xu, B., Deng, M., Wang, X., Chen, X., Hao, Z., & Ge, H. (2026). A comparative study of air cushion and roll-to-plate pressing in wafer-level nanoimprint lithography. Discover Nano. https://doi.org/10.1186/s11671-026-04958-z
Source records
- crossref · retrieved 2026-11-10T16:37:35.471Z