Near-field infrared nanoscopic study of EUV- and e-beam-exposed hydrogen silsesquioxane photoresist.

Kim J, Lee JK, Chae B, Ahn J, Lee S

Open source

DOI: 10.1186/s40580-022-00345-3
Published: 2022 Dec 2
Container: Nano convergence
Publisher: Not recorded
Open access: yes

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Cite this work

BibTeX

@article{allodium:10.1186/s40580-022-00345-3,
  title = {Near-field infrared nanoscopic study of EUV- and e-beam-exposed hydrogen silsesquioxane photoresist.},
  author = {Kim J and Lee JK and Chae B and Ahn J and Lee S},
  year = {2022},
  journal = {Nano convergence},
  doi = {10.1186/s40580-022-00345-3},
  url = {https://doi.org/10.1186/s40580-022-00345-3}
}

RIS

TY  - JOUR
TI  - Near-field infrared nanoscopic study of EUV- and e-beam-exposed hydrogen silsesquioxane photoresist.
AU  - Kim J
AU  - Lee JK
AU  - Chae B
AU  - Ahn J
AU  - Lee S
PY  - 2022
JO  - Nano convergence
DO  - 10.1186/s40580-022-00345-3
UR  - https://doi.org/10.1186/s40580-022-00345-3
ER  -

APA

J, K., JK, L., B, C., J, A., & S, L. (2022). Near-field infrared nanoscopic study of EUV- and e-beam-exposed hydrogen silsesquioxane photoresist.. Nano convergence. https://doi.org/10.1186/s40580-022-00345-3

Source records

pubmed · retrieved 2026-09-25T17:30:25.606Z
europe-pmc · retrieved 2026-09-25T17:30:25.641Z
doaj · retrieved 2026-09-25T17:30:25.655Z