Atmospheric pressure plasma etching of Ti-6Al-4 V using SF<sub>6</sub> etchant.

Bishop A, Huang Z, Giusca C, Bennett A, Castelli M, See TL.

Open source

DOI
10.1186/s40712-024-00200-9
Published
2025-09-11
Container
J Mater Sci Mater Eng
Publisher
Not recorded
Open access
yes

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BibTeX

@article{allodium:10.1186/s40712-024-00200-9,
  title = {Atmospheric pressure plasma etching of Ti-6Al-4 V using SF\<sub\>6\</sub\> etchant.},
  author = {Bishop A and  Huang Z and  Giusca C and  Bennett A and  Castelli M and  See TL.},
  year = {2025},
  journal = {J Mater Sci Mater Eng},
  doi = {10.1186/s40712-024-00200-9},
  url = {https://doi.org/10.1186/s40712-024-00200-9}
}

RIS

TY  - JOUR
TI  - Atmospheric pressure plasma etching of Ti-6Al-4 V using SF<sub>6</sub> etchant.
AU  - Bishop A
AU  -  Huang Z
AU  -  Giusca C
AU  -  Bennett A
AU  -  Castelli M
AU  -  See TL.
PY  - 2025
JO  - J Mater Sci Mater Eng
DO  - 10.1186/s40712-024-00200-9
UR  - https://doi.org/10.1186/s40712-024-00200-9
ER  - 

APA

A, B., Z, H., C, G., A, B., M, C., & TL., S. (2025). Atmospheric pressure plasma etching of Ti-6Al-4 V using SF<sub>6</sub> etchant.. J Mater Sci Mater Eng. https://doi.org/10.1186/s40712-024-00200-9

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