Atmospheric pressure plasma etching of Ti-6Al-4 V using SF<sub>6</sub> etchant.
- DOI
- 10.1186/s40712-024-00200-9
- Published
- 2025-09-11
- Container
- J Mater Sci Mater Eng
- Publisher
- Not recorded
- Open access
- yes
Credibility signals
uncertain Score 53/100 under policy 1.0.0. This is a metadata assessment, not a judgment of the paper's conclusions.
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Cite this work
BibTeX
@article{allodium:10.1186/s40712-024-00200-9,
title = {Atmospheric pressure plasma etching of Ti-6Al-4 V using SF\<sub\>6\</sub\> etchant.},
author = {Bishop A and Huang Z and Giusca C and Bennett A and Castelli M and See TL.},
year = {2025},
journal = {J Mater Sci Mater Eng},
doi = {10.1186/s40712-024-00200-9},
url = {https://doi.org/10.1186/s40712-024-00200-9}
}RIS
TY - JOUR TI - Atmospheric pressure plasma etching of Ti-6Al-4 V using SF<sub>6</sub> etchant. AU - Bishop A AU - Huang Z AU - Giusca C AU - Bennett A AU - Castelli M AU - See TL. PY - 2025 JO - J Mater Sci Mater Eng DO - 10.1186/s40712-024-00200-9 UR - https://doi.org/10.1186/s40712-024-00200-9 ER -
APA
A, B., Z, H., C, G., A, B., M, C., & TL., S. (2025). Atmospheric pressure plasma etching of Ti-6Al-4 V using SF<sub>6</sub> etchant.. J Mater Sci Mater Eng. https://doi.org/10.1186/s40712-024-00200-9
Source records
- europe-pmc · retrieved 2026-09-25T20:23:37.926Z
- doaj · retrieved 2026-09-25T20:23:37.926Z