Nanoscale etching characteristics for controlled AFM tomography of amorphous chalcogenide thin films

Siwon Park, Young-Min Kim, Jong-Souk Yeo

Open source

DOI: 10.1186/s42649-026-00147-5
Published: 2026-11-03
Container: Applied Microscopy
Publisher: Springer Science and Business Media LLC
Open access: unknown

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Cite this work

BibTeX

@article{allodium:10.1186/s42649-026-00147-5,
  title = {Nanoscale etching characteristics for controlled AFM tomography of amorphous chalcogenide thin films},
  author = {Siwon Park and Young-Min Kim and Jong-Souk Yeo},
  year = {2026},
  journal = {Applied Microscopy},
  doi = {10.1186/s42649-026-00147-5},
  url = {https://doi.org/10.1186/s42649-026-00147-5}
}

RIS

TY  - JOUR
TI  - Nanoscale etching characteristics for controlled AFM tomography of amorphous chalcogenide thin films
AU  - Siwon Park
AU  - Young-Min Kim
AU  - Jong-Souk Yeo
PY  - 2026
JO  - Applied Microscopy
DO  - 10.1186/s42649-026-00147-5
UR  - https://doi.org/10.1186/s42649-026-00147-5
ER  -

APA

Park, S., Kim, Y., & Yeo, J. (2026). Nanoscale etching characteristics for controlled AFM tomography of amorphous chalcogenide thin films. Applied Microscopy. https://doi.org/10.1186/s42649-026-00147-5

Source records

crossref · retrieved 2026-11-05T02:48:59.110Z