Quantifying the Proximity Effect in Electron Beam Lithography

Prthika Lanka, Fitunerediate Gashaw Gebeyehu, Ethan Ahn

DOI: 10.13021/jssr2026.5539
Published: 2026
Container: Not recorded
Publisher: Journal of Student-Scientists' Research
Open access: yes

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Cite this work

BibTeX

@article{allodium:10.13021/jssr2026.5539,
  title = {Quantifying the Proximity Effect in Electron Beam Lithography},
  author = {Prthika Lanka and Fitunerediate Gashaw Gebeyehu and Ethan Ahn},
  year = {2026},
  doi = {10.13021/jssr2026.5539},
  url = {https://doi.org/10.13021/jssr2026.5539}
}

RIS

TY  - JOUR
TI  - Quantifying the Proximity Effect in Electron Beam Lithography
AU  - Prthika Lanka
AU  - Fitunerediate Gashaw Gebeyehu
AU  - Ethan Ahn
PY  - 2026
DO  - 10.13021/jssr2026.5539
UR  - https://doi.org/10.13021/jssr2026.5539
ER  -

APA

Lanka, P., Gebeyehu, F. G., & Ahn, E. (2026). Quantifying the Proximity Effect in Electron Beam Lithography. https://doi.org/10.13021/jssr2026.5539

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datacite · retrieved 2026-09-25T17:19:15.784Z