Development of optical coatings for 157-nm lithography. I. Coating materials.

Niisaka S, Saito T, Saito J, Tanaka A, Matsumoto A, Otani M, Biro R, Ouchi C, Hasegawa M, Suzuki Y, Sone K

DOI: 10.1364/ao.41.003242
Published: 2002 Jun 1
Container: Applied optics
Publisher: Not recorded
Open access: unknown

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Cite this work

BibTeX

@article{allodium:10.1364/ao.41.003242,
  title = {Development of optical coatings for 157-nm lithography. I. Coating materials.},
  author = {Niisaka S and Saito T and Saito J and Tanaka A and Matsumoto A and Otani M and Biro R and Ouchi C and Hasegawa M and Suzuki Y and Sone K},
  year = {2002},
  journal = {Applied optics},
  doi = {10.1364/ao.41.003242},
  url = {https://doi.org/10.1364/ao.41.003242}
}

RIS

TY  - JOUR
TI  - Development of optical coatings for 157-nm lithography. I. Coating materials.
AU  - Niisaka S
AU  - Saito T
AU  - Saito J
AU  - Tanaka A
AU  - Matsumoto A
AU  - Otani M
AU  - Biro R
AU  - Ouchi C
AU  - Hasegawa M
AU  - Suzuki Y
AU  - Sone K
PY  - 2002
JO  - Applied optics
DO  - 10.1364/ao.41.003242
UR  - https://doi.org/10.1364/ao.41.003242
ER  -

APA

S, N., T, S., J, S., A, T., A, M., M, O., R, B., C, O., M, H., Y, S., & K, S. (2002). Development of optical coatings for 157-nm lithography. I. Coating materials.. Applied optics. https://doi.org/10.1364/ao.41.003242

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pubmed · retrieved 2026-09-25T10:22:28.407Z