Development of optical coatings for 157-nm lithography. II. Reflectance, absorption, and scatter measurement.

Otani M, Biro R, Ouchi C, Hasegawa M, Suzuki Y, Sone K, Niisaka S, Saito T, Saito J, Tanaka A, Matsumoto A

DOI: 10.1364/ao.41.003248
Published: 2002 Jun 1
Container: Applied optics
Publisher: Not recorded
Open access: unknown

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Cite this work

BibTeX

@article{allodium:10.1364/ao.41.003248,
  title = {Development of optical coatings for 157-nm lithography. II. Reflectance, absorption, and scatter measurement.},
  author = {Otani M and Biro R and Ouchi C and Hasegawa M and Suzuki Y and Sone K and Niisaka S and Saito T and Saito J and Tanaka A and Matsumoto A},
  year = {2002},
  journal = {Applied optics},
  doi = {10.1364/ao.41.003248},
  url = {https://doi.org/10.1364/ao.41.003248}
}

RIS

TY  - JOUR
TI  - Development of optical coatings for 157-nm lithography. II. Reflectance, absorption, and scatter measurement.
AU  - Otani M
AU  - Biro R
AU  - Ouchi C
AU  - Hasegawa M
AU  - Suzuki Y
AU  - Sone K
AU  - Niisaka S
AU  - Saito T
AU  - Saito J
AU  - Tanaka A
AU  - Matsumoto A
PY  - 2002
JO  - Applied optics
DO  - 10.1364/ao.41.003248
UR  - https://doi.org/10.1364/ao.41.003248
ER  -

APA

M, O., R, B., C, O., M, H., Y, S., K, S., S, N., T, S., J, S., A, T., & A, M. (2002). Development of optical coatings for 157-nm lithography. II. Reflectance, absorption, and scatter measurement.. Applied optics. https://doi.org/10.1364/ao.41.003248

Source records

pubmed · retrieved 2026-09-25T09:24:00.446Z