GLAU-Net: a fast lithography imaging model for chemically amplified resists.

Fu W, Li S, Ma X

DOI: 10.1364/ao.584083
Published: 2026 Apr 1
Container: Applied optics
Publisher: Not recorded
Open access: unknown

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Cite this work

BibTeX

@article{allodium:10.1364/ao.584083,
  title = {GLAU-Net: a fast lithography imaging model for chemically amplified resists.},
  author = {Fu W and Li S and Ma X},
  year = {2026},
  journal = {Applied optics},
  doi = {10.1364/ao.584083},
  url = {https://doi.org/10.1364/ao.584083}
}

RIS

TY  - JOUR
TI  - GLAU-Net: a fast lithography imaging model for chemically amplified resists.
AU  - Fu W
AU  - Li S
AU  - Ma X
PY  - 2026
JO  - Applied optics
DO  - 10.1364/ao.584083
UR  - https://doi.org/10.1364/ao.584083
ER  -

APA

W, F., S, L., & X, M. (2026). GLAU-Net: a fast lithography imaging model for chemically amplified resists.. Applied optics. https://doi.org/10.1364/ao.584083

Source records

pubmed · retrieved 2026-09-25T08:58:12.076Z