Virtual metrology for process perturbation prediction in lithographic alignment marks using a physics-guided directed attention network
- DOI
- 10.1364/ao.611381
- Published
- 2026-11-05
- Container
- Applied Optics
- Publisher
- Optica Publishing Group
- Open access
- unknown
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Cite this work
BibTeX
@article{allodium:10.1364/ao.611381,
title = {Virtual metrology for process perturbation prediction in lithographic alignment marks using a physics-guided directed attention network},
author = {Shiqing Lu and Zhipeng Wu and Yuejing Qi and Jiani Su and Hao Jin and Xin Zhou and Bokai Su},
year = {2026},
journal = {Applied Optics},
doi = {10.1364/ao.611381},
url = {https://doi.org/10.1364/ao.611381}
}RIS
TY - JOUR TI - Virtual metrology for process perturbation prediction in lithographic alignment marks using a physics-guided directed attention network AU - Shiqing Lu AU - Zhipeng Wu AU - Yuejing Qi AU - Jiani Su AU - Hao Jin AU - Xin Zhou AU - Bokai Su PY - 2026 JO - Applied Optics DO - 10.1364/ao.611381 UR - https://doi.org/10.1364/ao.611381 ER -
APA
Lu, S., Wu, Z., Qi, Y., Su, J., Jin, H., Zhou, X., & Su, B. (2026). Virtual metrology for process perturbation prediction in lithographic alignment marks using a physics-guided directed attention network. Applied Optics. https://doi.org/10.1364/ao.611381
Source records
- crossref · retrieved 2026-11-11T01:45:12.038Z