Tangential-sagittal decomposition-combination design method for a large-field anamorphic extreme ultraviolet lithography projection objective.

Nan Y, Zhang Z, Li Y

DOI: 10.1364/ao.613136
Published: 2026 Nov 10
Container: Applied optics
Publisher: Not recorded
Open access: unknown

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Cite this work

BibTeX

@article{allodium:10.1364/ao.613136,
  title = {Tangential-sagittal decomposition-combination design method for a large-field anamorphic extreme ultraviolet lithography projection objective.},
  author = {Nan Y and Zhang Z and Li Y},
  year = {2026},
  journal = {Applied optics},
  doi = {10.1364/ao.613136},
  url = {https://doi.org/10.1364/ao.613136}
}

RIS

TY  - JOUR
TI  - Tangential-sagittal decomposition-combination design method for a large-field anamorphic extreme ultraviolet lithography projection objective.
AU  - Nan Y
AU  - Zhang Z
AU  - Li Y
PY  - 2026
JO  - Applied optics
DO  - 10.1364/ao.613136
UR  - https://doi.org/10.1364/ao.613136
ER  -

APA

Y, N., Z, Z., & Y, L. (2026). Tangential-sagittal decomposition-combination design method for a large-field anamorphic extreme ultraviolet lithography projection objective.. Applied optics. https://doi.org/10.1364/ao.613136

Source records

pubmed · retrieved 2026-11-11T00:14:40.277Z