Balanced bottom and end light source layout for high-flow UVC-LED disinfection reactors under varying water quality conditions.
- DOI
- 10.1364/ao.615612
- Published
- 2026 Nov 10
- Container
- Applied optics
- Publisher
- Not recorded
- Open access
- unknown
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Cite this work
BibTeX
@article{allodium:10.1364/ao.615612,
title = {Balanced bottom and end light source layout for high-flow UVC-LED disinfection reactors under varying water quality conditions.},
author = {Wu S and Sun X and Gong M and Fan C and Liang T and Lei C and Liu N and Yan J and Wang J and Li J and Yang T and Liu Q and Feng H and Zhang Y},
year = {2026},
journal = {Applied optics},
doi = {10.1364/ao.615612},
url = {https://doi.org/10.1364/ao.615612}
}RIS
TY - JOUR TI - Balanced bottom and end light source layout for high-flow UVC-LED disinfection reactors under varying water quality conditions. AU - Wu S AU - Sun X AU - Gong M AU - Fan C AU - Liang T AU - Lei C AU - Liu N AU - Yan J AU - Wang J AU - Li J AU - Yang T AU - Liu Q AU - Feng H AU - Zhang Y PY - 2026 JO - Applied optics DO - 10.1364/ao.615612 UR - https://doi.org/10.1364/ao.615612 ER -
APA
S, W., X, S., M, G., C, F., T, L., C, L., N, L., J, Y., J, W., J, L., T, Y., Q, L., H, F., & Y, Z. (2026). Balanced bottom and end light source layout for high-flow UVC-LED disinfection reactors under varying water quality conditions.. Applied optics. https://doi.org/10.1364/ao.615612
Source records
- pubmed · retrieved 2026-11-11T00:07:29.329Z