FWave: a fast 3D resist model with dual-branch architecture for EUV lithography simulation.

Zhang Y, Liu R, Tan J, Dong L, Wei Y

DOI: 10.1364/oe.603845
Published: 2026 Jul 13
Container: Optics express
Publisher: Not recorded
Open access: unknown

Credibility signals

limited evidence Score 43/100 under policy 1.0.0. This is a metadata assessment, not a judgment of the paper's conclusions.

Show all credibility signals

cautionDOI registered: No matching Crossref record was present in this response. Source: Crossref; license: CC0 metadata
cautionDOI resolves: No matching Crossref record was present in this response. Source: Crossref; license: CC0 metadata
not scoredDirectory of Open Access Journals: No matching DOAJ record was present in this response. No allow-list match; this is not evidence of low credibility. Source: DOAJ; license: CC0
not scoredMEDLINE indexed: Not checked or no result supplied; no credibility inference made. Source: No authority result supplied; license: Unknown
not scoredOpenAlex core source: Not checked or no result supplied; no credibility inference made. Source: No authority result supplied; license: Unknown
not scoredKnown publisher allow-list: Not checked or no result supplied; no credibility inference made. Source: No authority result supplied; license: Unknown
not scoredROR affiliation: Not checked or no result supplied; no credibility inference made. Source: No authority result supplied; license: Unknown
not scoredRetraction Watch retraction: No retraction notice matched this DOI in the deployed snapshot. No matching event found; coverage may be incomplete. Source: Retraction Watch; license: CC BY 4.0
not scoredRetraction Watch expression of concern: No expression of concern notice matched this DOI in the deployed snapshot. No matching event found; coverage may be incomplete. Source: Retraction Watch; license: CC BY 4.0
not scoredRetraction Watch correction: No correction notice matched this DOI in the deployed snapshot. No matching event found; coverage may be incomplete. Source: Retraction Watch; license: CC BY 4.0
not scoredRetraction Watch reinstatement: No reinstatement notice matched this DOI in the deployed snapshot. No matching event found; coverage may be incomplete. Source: Retraction Watch; license: CC BY 4.0
not scoredOpen access status: Not checked or no result supplied; no credibility inference made. Source: No authority result supplied; license: Unknown
not scoredPublication license: Not checked or no result supplied; no credibility inference made. Source: No authority result supplied; license: Unknown
not scoredPublication version: A publication version was supplied but is not scored. Source: Normalized work metadata; license: Caller-provided; provenance license not supplied to scorer
cautionMetadata completeness: 5 of 6 scored descriptive metadata groups are present; missing fields increase uncertainty. Source: Normalized work metadata; license: Caller-provided; provenance license not supplied to scorer

Cite this work

BibTeX

@article{allodium:10.1364/oe.603845,
  title = {FWave: a fast 3D resist model with dual-branch architecture for EUV lithography simulation.},
  author = {Zhang Y and Liu R and Tan J and Dong L and Wei Y},
  year = {2026},
  journal = {Optics express},
  doi = {10.1364/oe.603845},
  url = {https://doi.org/10.1364/oe.603845}
}

RIS

TY  - JOUR
TI  - FWave: a fast 3D resist model with dual-branch architecture for EUV lithography simulation.
AU  - Zhang Y
AU  - Liu R
AU  - Tan J
AU  - Dong L
AU  - Wei Y
PY  - 2026
JO  - Optics express
DO  - 10.1364/oe.603845
UR  - https://doi.org/10.1364/oe.603845
ER  -

APA

Y, Z., R, L., J, T., L, D., & Y, W. (2026). FWave: a fast 3D resist model with dual-branch architecture for EUV lithography simulation.. Optics express. https://doi.org/10.1364/oe.603845

Source records

pubmed · retrieved 2026-09-26T01:11:32.975Z