Wafer alignment measurement using vortex beam interferometry and double diffraction by the same grating
- DOI
- 10.1364/oe.612726
- Published
- 2026-10-05
- Container
- Optics Express
- Publisher
- Optica Publishing Group
- Open access
- unknown
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Cite this work
BibTeX
@article{allodium:10.1364/oe.612726,
title = {Wafer alignment measurement using vortex beam interferometry and double diffraction by the same grating},
author = {Lijun Zhou and Li Chen and Zhongliang Li and Peng Feng and Kaining Zhang and Jinming Gao and Lan Wu and Xiangzhao Wang},
year = {2026},
journal = {Optics Express},
doi = {10.1364/oe.612726},
url = {https://doi.org/10.1364/oe.612726}
}RIS
TY - JOUR TI - Wafer alignment measurement using vortex beam interferometry and double diffraction by the same grating AU - Lijun Zhou AU - Li Chen AU - Zhongliang Li AU - Peng Feng AU - Kaining Zhang AU - Jinming Gao AU - Lan Wu AU - Xiangzhao Wang PY - 2026 JO - Optics Express DO - 10.1364/oe.612726 UR - https://doi.org/10.1364/oe.612726 ER -
APA
Zhou, L., Chen, L., Li, Z., Feng, P., Zhang, K., Gao, J., Wu, L., & Wang, X. (2026). Wafer alignment measurement using vortex beam interferometry and double diffraction by the same grating. Optics Express. https://doi.org/10.1364/oe.612726
Source records
- crossref · retrieved 2026-11-03T08:21:05.101Z