Enhanced nanometer-scale linewidth metrology using dark-field through-focus scanning optical microscopy.

Kim SJ, Joo JY, Lee JH, Kwon OH

DOI: 10.1364/oe.612996
Published: 2026 Oct 19
Container: Optics express
Publisher: Not recorded
Open access: unknown

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Cite this work

BibTeX

@article{allodium:10.1364/oe.612996,
  title = {Enhanced nanometer-scale linewidth metrology using dark-field through-focus scanning optical microscopy.},
  author = {Kim SJ and Joo JY and Lee JH and Kwon OH},
  year = {2026},
  journal = {Optics express},
  doi = {10.1364/oe.612996},
  url = {https://doi.org/10.1364/oe.612996}
}

RIS

TY  - JOUR
TI  - Enhanced nanometer-scale linewidth metrology using dark-field through-focus scanning optical microscopy.
AU  - Kim SJ
AU  - Joo JY
AU  - Lee JH
AU  - Kwon OH
PY  - 2026
JO  - Optics express
DO  - 10.1364/oe.612996
UR  - https://doi.org/10.1364/oe.612996
ER  -

APA

SJ, K., JY, J., JH, L., & OH, K. (2026). Enhanced nanometer-scale linewidth metrology using dark-field through-focus scanning optical microscopy.. Optics express. https://doi.org/10.1364/oe.612996

Source records

pubmed · retrieved 2026-11-10T07:07:40.423Z