Model-fitting perspective on the robustness and speed of CLASS in reflection matrix microscopy.

Luts De Martelaere W, Tran DH, Lee H, Gupta K, Lee YR, Kang S, Yoon S, Choi W

DOI: 10.1364/oe.614136
Published: 2026 Nov 2
Container: Optics express
Publisher: Not recorded
Open access: unknown

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Cite this work

BibTeX

@article{allodium:10.1364/oe.614136,
  title = {Model-fitting perspective on the robustness and speed of CLASS in reflection matrix microscopy.},
  author = {Luts De Martelaere W and Tran DH and Lee H and Gupta K and Lee YR and Kang S and Yoon S and Choi W},
  year = {2026},
  journal = {Optics express},
  doi = {10.1364/oe.614136},
  url = {https://doi.org/10.1364/oe.614136}
}

RIS

TY  - JOUR
TI  - Model-fitting perspective on the robustness and speed of CLASS in reflection matrix microscopy.
AU  - Luts De Martelaere W
AU  - Tran DH
AU  - Lee H
AU  - Gupta K
AU  - Lee YR
AU  - Kang S
AU  - Yoon S
AU  - Choi W
PY  - 2026
JO  - Optics express
DO  - 10.1364/oe.614136
UR  - https://doi.org/10.1364/oe.614136
ER  -

APA

W, L. D. M., DH, T., H, L., K, G., YR, L., S, K., S, Y., & W, C. (2026). Model-fitting perspective on the robustness and speed of CLASS in reflection matrix microscopy.. Optics express. https://doi.org/10.1364/oe.614136

Source records

pubmed · retrieved 2026-11-10T06:03:04.451Z