Polishing-induced contamination of fused silica optics and laser induced damage density at 351 nm.

Neauport J, Lamaignere L, Bercegol H, Pilon F, Birolleau JC

DOI: 10.1364/opex.13.010163
Published: 2005 Dec 12
Container: Optics express
Publisher: Not recorded
Open access: unknown

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Cite this work

BibTeX

@article{allodium:10.1364/opex.13.010163,
  title = {Polishing-induced contamination of fused silica optics and laser induced damage density at 351 nm.},
  author = {Neauport J and Lamaignere L and Bercegol H and Pilon F and Birolleau JC},
  year = {2005},
  journal = {Optics express},
  doi = {10.1364/opex.13.010163},
  url = {https://doi.org/10.1364/opex.13.010163}
}

RIS

TY  - JOUR
TI  - Polishing-induced contamination of fused silica optics and laser induced damage density at 351 nm.
AU  - Neauport J
AU  - Lamaignere L
AU  - Bercegol H
AU  - Pilon F
AU  - Birolleau JC
PY  - 2005
JO  - Optics express
DO  - 10.1364/opex.13.010163
UR  - https://doi.org/10.1364/opex.13.010163
ER  -

APA

J, N., L, L., H, B., F, P., & JC, B. (2005). Polishing-induced contamination of fused silica optics and laser induced damage density at 351 nm.. Optics express. https://doi.org/10.1364/opex.13.010163

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pubmed · retrieved 2026-09-25T05:18:18.645Z