A distributionally-robust bayesian adaptive EWMA chart for joint surveillance of lognormal process location and scale.

Ali H, Saidani O, Kouki M, Himmat B

DOI: 10.1371/journal.pone.0343029
Published: 2026
Container: PloS one
Publisher: Not recorded
Open access: yes

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Cite this work

BibTeX

@article{allodium:10.1371/journal.pone.0343029,
  title = {A distributionally-robust bayesian adaptive EWMA chart for joint surveillance of lognormal process location and scale.},
  author = {Ali H and Saidani O and Kouki M and Himmat B},
  year = {2026},
  journal = {PloS one},
  doi = {10.1371/journal.pone.0343029},
  url = {https://doi.org/10.1371/journal.pone.0343029}
}

RIS

TY  - JOUR
TI  - A distributionally-robust bayesian adaptive EWMA chart for joint surveillance of lognormal process location and scale.
AU  - Ali H
AU  - Saidani O
AU  - Kouki M
AU  - Himmat B
PY  - 2026
JO  - PloS one
DO  - 10.1371/journal.pone.0343029
UR  - https://doi.org/10.1371/journal.pone.0343029
ER  -

APA

H, A., O, S., M, K., & B, H. (2026). A distributionally-robust bayesian adaptive EWMA chart for joint surveillance of lognormal process location and scale.. PloS one. https://doi.org/10.1371/journal.pone.0343029

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pubmed · retrieved 2026-09-25T18:26:18.107Z