Silicon Nitride (Si(3)N(4)) Implants: The Future of Dental Implantology?

Badran Z, Struillou X, Hughes FJ, Soueidan A, Hoornaert A, Ide M

DOI: 10.1563/aaid-joi-d-16-00146
Published: 2017 Jun
Container: The Journal of oral implantology
Publisher: Not recorded
Open access: unknown

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Cite this work

BibTeX

@article{allodium:10.1563/aaid-joi-d-16-00146,
  title = {Silicon Nitride (Si(3)N(4)) Implants: The Future of Dental Implantology?},
  author = {Badran Z and Struillou X and Hughes FJ and Soueidan A and Hoornaert A and Ide M},
  year = {2017},
  journal = {The Journal of oral implantology},
  doi = {10.1563/aaid-joi-d-16-00146},
  url = {https://doi.org/10.1563/aaid-joi-d-16-00146}
}

RIS

TY  - JOUR
TI  - Silicon Nitride (Si(3)N(4)) Implants: The Future of Dental Implantology?
AU  - Badran Z
AU  - Struillou X
AU  - Hughes FJ
AU  - Soueidan A
AU  - Hoornaert A
AU  - Ide M
PY  - 2017
JO  - The Journal of oral implantology
DO  - 10.1563/aaid-joi-d-16-00146
UR  - https://doi.org/10.1563/aaid-joi-d-16-00146
ER  -

APA

Z, B., X, S., FJ, H., A, S., A, H., & M, I. (2017). Silicon Nitride (Si(3)N(4)) Implants: The Future of Dental Implantology?. The Journal of oral implantology. https://doi.org/10.1563/aaid-joi-d-16-00146

Source records

pubmed · retrieved 2026-09-27T00:42:52.462Z