Indentation Response and Contact Damage of Hard T-B-N Films Deposited by Magnetron Sputtering

P. K. Purnapu Rupa, P. C. Chakraborti, S. K. Mishra

Open source

DOI: 10.18321/ectj70
Published: 2011-04-22
Container: Eurasian Chemico-Technological Journal
Publisher: Institute of Combustion Problems
Open access: unknown

Credibility signals

uncertain Score 64/100 under policy 1.0.0. This is a metadata assessment, not a judgment of the paper's conclusions.

Show all credibility signals

supportingDOI registered: A matching record was returned by Crossref. Source: Crossref; license: CC0 metadata
supportingDOI resolves: A matching record was returned by Crossref. Source: Crossref; license: CC0 metadata
not scoredDirectory of Open Access Journals: No matching DOAJ record was present in this response. No allow-list match; this is not evidence of low credibility. Source: DOAJ; license: CC0
not scoredMEDLINE indexed: Not checked or no result supplied; no credibility inference made. Source: No authority result supplied; license: Unknown
not scoredOpenAlex core source: Not checked or no result supplied; no credibility inference made. Source: No authority result supplied; license: Unknown
not scoredKnown publisher allow-list: Not checked or no result supplied; no credibility inference made. Source: No authority result supplied; license: Unknown
not scoredROR affiliation: Not checked or no result supplied; no credibility inference made. Source: No authority result supplied; license: Unknown
not scoredRetraction Watch retraction: No retraction notice matched this DOI in the deployed snapshot. No matching event found; coverage may be incomplete. Source: Retraction Watch; license: CC BY 4.0
not scoredRetraction Watch expression of concern: No expression of concern notice matched this DOI in the deployed snapshot. No matching event found; coverage may be incomplete. Source: Retraction Watch; license: CC BY 4.0
not scoredRetraction Watch correction: No correction notice matched this DOI in the deployed snapshot. No matching event found; coverage may be incomplete. Source: Retraction Watch; license: CC BY 4.0
not scoredRetraction Watch reinstatement: No reinstatement notice matched this DOI in the deployed snapshot. No matching event found; coverage may be incomplete. Source: Retraction Watch; license: CC BY 4.0
not scoredOpen access status: Not checked or no result supplied; no credibility inference made. Source: No authority result supplied; license: Unknown
not scoredPublication license: Not checked or no result supplied; no credibility inference made. Source: No authority result supplied; license: Unknown
not scoredPublication version: A publication version was supplied but is not scored. Source: Normalized work metadata; license: Caller-provided; provenance license not supplied to scorer
supportingMetadata completeness: All 6 scored descriptive metadata groups are present. Source: Normalized work metadata; license: Caller-provided; provenance license not supplied to scorer

Cite this work

BibTeX

@article{allodium:10.18321/ectj70,
  title = {Indentation Response and Contact Damage of Hard T-B-N Films Deposited by Magnetron Sputtering},
  author = {P. K. Purnapu Rupa and P. C. Chakraborti and S. K. Mishra},
  year = {2011},
  journal = {Eurasian Chemico-Technological Journal},
  doi = {10.18321/ectj70},
  url = {https://doi.org/10.18321/ectj70}
}

RIS

TY  - JOUR
TI  - Indentation Response and Contact Damage of Hard T-B-N Films Deposited by Magnetron Sputtering
AU  - P. K. Purnapu Rupa
AU  - P. C. Chakraborti
AU  - S. K. Mishra
PY  - 2011
JO  - Eurasian Chemico-Technological Journal
DO  - 10.18321/ectj70
UR  - https://doi.org/10.18321/ectj70
ER  -

APA

Rupa, P. K. P., Chakraborti, P. C., & Mishra, S. K. (2011). Indentation Response and Contact Damage of Hard T-B-N Films Deposited by Magnetron Sputtering. Eurasian Chemico-Technological Journal. https://doi.org/10.18321/ectj70

Source records

crossref · retrieved 2026-09-24T18:26:10.866Z