Design Optimization of Focus Ring Geometry for Improved Wafer-Edge Ion Energy-Angle Distributions in Pulsed Capacitively Coupled Plasma Etching

Hwang SJ, Lee HJ.

DOI: 10.20944/preprints202607.1095.v1
Published: 2026-07-15
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Cite this work

BibTeX

@article{allodium:10.20944/preprints202607.1095.v1,
  title = {Design Optimization of Focus Ring Geometry for Improved Wafer-Edge Ion Energy-Angle Distributions in Pulsed Capacitively Coupled Plasma Etching},
  author = {Hwang SJ and  Lee HJ.},
  year = {2026},
  doi = {10.20944/preprints202607.1095.v1},
  url = {https://doi.org/10.20944/preprints202607.1095.v1}
}

RIS

TY  - JOUR
TI  - Design Optimization of Focus Ring Geometry for Improved Wafer-Edge Ion Energy-Angle Distributions in Pulsed Capacitively Coupled Plasma Etching
AU  - Hwang SJ
AU  -  Lee HJ.
PY  - 2026
DO  - 10.20944/preprints202607.1095.v1
UR  - https://doi.org/10.20944/preprints202607.1095.v1
ER  -

APA

SJ, H., & HJ., L. (2026). Design Optimization of Focus Ring Geometry for Improved Wafer-Edge Ion Energy-Angle Distributions in Pulsed Capacitively Coupled Plasma Etching. https://doi.org/10.20944/preprints202607.1095.v1

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europe-pmc · retrieved 2026-09-25T07:52:04.892Z