Synthesis of Sulfur-Doped Amorphous Carbon Thin Films by Plasma CVD Using Thiophene as a Starting Material.
- DOI
- 10.2109/jcersj.111.133
- Published
- 2003
- Container
- Journal of the Ceramic Society of Japan
- Publisher
- Ceramic Society of Japan
- Open access
- unknown
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Cite this work
BibTeX
@article{allodium:10.2109/jcersj.111.133,
title = {Synthesis of Sulfur-Doped Amorphous Carbon Thin Films by Plasma CVD Using Thiophene as a Starting Material.},
author = {Takao HIRAIDE and Akio ONO and Toru FUSEGI and Nobutaka TAKEZAWA and Shin-ichi KURODA and Mamoru YOSHIMOTO and Hideo YAMADA},
year = {2003},
journal = {Journal of the Ceramic Society of Japan},
doi = {10.2109/jcersj.111.133},
url = {https://doi.org/10.2109/jcersj.111.133}
}RIS
TY - JOUR TI - Synthesis of Sulfur-Doped Amorphous Carbon Thin Films by Plasma CVD Using Thiophene as a Starting Material. AU - Takao HIRAIDE AU - Akio ONO AU - Toru FUSEGI AU - Nobutaka TAKEZAWA AU - Shin-ichi KURODA AU - Mamoru YOSHIMOTO AU - Hideo YAMADA PY - 2003 JO - Journal of the Ceramic Society of Japan DO - 10.2109/jcersj.111.133 UR - https://doi.org/10.2109/jcersj.111.133 ER -
APA
HIRAIDE, T., ONO, A., FUSEGI, T., TAKEZAWA, N., KURODA, S., YOSHIMOTO, M., & YAMADA, H. (2003). Synthesis of Sulfur-Doped Amorphous Carbon Thin Films by Plasma CVD Using Thiophene as a Starting Material.. Journal of the Ceramic Society of Japan. https://doi.org/10.2109/jcersj.111.133
Source records
- crossref · retrieved 2026-09-27T00:08:25.690Z