Fabrication and Electrical Characterization of Radio Frequency Magnetron Sputtered Al₂O₃ Thin-Film Metal–Insulator–Metal Capacitors on Platinized Silicon

Abdullah

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DOI: 10.21203/rs.3.rs-10296245/v1
Published: 2026-07-10
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Publisher: Springer Science and Business Media LLC
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Cite this work

BibTeX

@article{allodium:10.21203/rs.3.rs-10296245/v1,
  title = {Fabrication and Electrical Characterization of Radio Frequency Magnetron Sputtered Al₂O₃ Thin-Film Metal–Insulator–Metal Capacitors on Platinized Silicon},
  author = {Abdullah},
  year = {2026},
  doi = {10.21203/rs.3.rs-10296245/v1},
  url = {https://doi.org/10.21203/rs.3.rs-10296245/v1}
}

RIS

TY  - JOUR
TI  - Fabrication and Electrical Characterization of Radio Frequency Magnetron Sputtered Al₂O₃ Thin-Film Metal–Insulator–Metal Capacitors on Platinized Silicon
AU  - Abdullah
PY  - 2026
DO  - 10.21203/rs.3.rs-10296245/v1
UR  - https://doi.org/10.21203/rs.3.rs-10296245/v1
ER  -

APA

Abdullah (2026). Fabrication and Electrical Characterization of Radio Frequency Magnetron Sputtered Al₂O₃ Thin-Film Metal–Insulator–Metal Capacitors on Platinized Silicon. https://doi.org/10.21203/rs.3.rs-10296245/v1

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crossref · retrieved 2026-09-26T06:31:49.654Z