Sub-Nanometer Line Edge Roughness in Helium-ion Lithography

Xing Cheng, Xin Zhuang, Yunsheng Deng, Yue Zhang, Kaimin Wang, Yulong Chen, Shiyang Gao, Jingfu Xu, Liqiu WANG

Open source

DOI: 10.21203/rs.3.rs-4252959/v1
Published: 2024-04-23
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Publisher: Springer Science and Business Media LLC
Open access: unknown

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Cite this work

BibTeX

@article{allodium:10.21203/rs.3.rs-4252959/v1,
  title = {Sub-Nanometer Line Edge Roughness in Helium-ion Lithography},
  author = {Xing Cheng and Xin Zhuang and Yunsheng Deng and Yue Zhang and Kaimin Wang and Yulong Chen and Shiyang Gao and Jingfu Xu and Liqiu WANG},
  year = {2024},
  doi = {10.21203/rs.3.rs-4252959/v1},
  url = {https://doi.org/10.21203/rs.3.rs-4252959/v1}
}

RIS

TY  - JOUR
TI  - Sub-Nanometer Line Edge Roughness in Helium-ion Lithography
AU  - Xing Cheng
AU  - Xin Zhuang
AU  - Yunsheng Deng
AU  - Yue Zhang
AU  - Kaimin Wang
AU  - Yulong Chen
AU  - Shiyang Gao
AU  - Jingfu Xu
AU  - Liqiu WANG
PY  - 2024
DO  - 10.21203/rs.3.rs-4252959/v1
UR  - https://doi.org/10.21203/rs.3.rs-4252959/v1
ER  -

APA

Cheng, X., Zhuang, X., Deng, Y., Zhang, Y., Wang, K., Chen, Y., Gao, S., Xu, J., & WANG, L. (2024). Sub-Nanometer Line Edge Roughness in Helium-ion Lithography. https://doi.org/10.21203/rs.3.rs-4252959/v1

Source records

crossref · retrieved 2026-09-25T19:14:28.312Z