Simulation of 2D material-based tunnel field-effect transistors: planar vs. vertical architectures

Jiang Cao, Jejune Park, François Triozon, Marco G. Pala, Alessandro Cresti

Open source

DOI
10.21494/iste.op.2018.0222
Published
2018-02
Container
Composants nanoélectroniques
Publisher
ISTE Group
Open access
unknown

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BibTeX

@article{allodium:10.21494/iste.op.2018.0222,
  title = {Simulation of 2D material-based tunnel field-effect transistors: planar vs. vertical architectures},
  author = {Jiang Cao and Jejune Park and François Triozon and Marco G. Pala and Alessandro Cresti},
  year = {2018},
  journal = {Composants nanoélectroniques},
  doi = {10.21494/iste.op.2018.0222},
  url = {https://doi.org/10.21494/iste.op.2018.0222}
}

RIS

TY  - JOUR
TI  - Simulation of 2D material-based tunnel field-effect transistors: planar vs. vertical architectures
AU  - Jiang Cao
AU  - Jejune Park
AU  - François Triozon
AU  - Marco G. Pala
AU  - Alessandro Cresti
PY  - 2018
JO  - Composants nanoélectroniques
DO  - 10.21494/iste.op.2018.0222
UR  - https://doi.org/10.21494/iste.op.2018.0222
ER  - 

APA

Cao, J., Park, J., Triozon, F., Pala, M. G., & Cresti, A. (2018). Simulation of 2D material-based tunnel field-effect transistors: planar vs. vertical architectures. Composants nanoélectroniques. https://doi.org/10.21494/iste.op.2018.0222

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