Optimised magnetron sputtering method for the deposition of indium tin oxide layers
- DOI
- 10.24425/bpasts.2021.139005
- Published
- 2021-11-04
- Container
- Bulletin of the Polish Academy of Sciences Technical Sciences
- Publisher
- Polish Academy of Sciences Chancellery
- Open access
- unknown
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Cite this work
BibTeX
@article{allodium:10.24425/bpasts.2021.139005,
title = {Optimised magnetron sputtering method for the deposition of indium tin oxide layers},
author = {Małgorzata Musztyfaga-Staszuk and Dušan Pudiš and Robert Socha and Katarzyna Gawlińska-Nęcek and Piotr Panek},
year = {2021},
journal = {Bulletin of the Polish Academy of Sciences Technical Sciences},
doi = {10.24425/bpasts.2021.139005},
url = {https://doi.org/10.24425/bpasts.2021.139005}
}RIS
TY - JOUR TI - Optimised magnetron sputtering method for the deposition of indium tin oxide layers AU - Małgorzata Musztyfaga-Staszuk AU - Dušan Pudiš AU - Robert Socha AU - Katarzyna Gawlińska-Nęcek AU - Piotr Panek PY - 2021 JO - Bulletin of the Polish Academy of Sciences Technical Sciences DO - 10.24425/bpasts.2021.139005 UR - https://doi.org/10.24425/bpasts.2021.139005 ER -
APA
Musztyfaga-Staszuk, M., Pudiš, D., Socha, R., Gawlińska-Nęcek, K., & Panek, P. (2021). Optimised magnetron sputtering method for the deposition of indium tin oxide layers. Bulletin of the Polish Academy of Sciences Technical Sciences. https://doi.org/10.24425/bpasts.2021.139005
Source records
- crossref · retrieved 2026-09-26T18:43:21.389Z