An Automated Magnetron Sputtering Chamber for Ferroelectric Thin Film Deposition
- DOI
- 10.26207/vnh1-wf39
- Published
- 2026
- Container
- Not recorded
- Publisher
- scholarsphere
- Open access
- no
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Cite this work
BibTeX
@article{allodium:10.26207/vnh1-wf39,
title = {An Automated Magnetron Sputtering Chamber for Ferroelectric Thin Film Deposition},
author = {Darren Pagan and Ian Mercer and Jon-Paul Maria and Kevin Dressler and Ric Wilburn and Susan E Trolier-Mckinstry and Stanislav Udovenko and Sarah Olandt},
year = {2026},
doi = {10.26207/vnh1-wf39},
url = {https://doi.org/10.26207/vnh1-wf39}
}RIS
TY - JOUR TI - An Automated Magnetron Sputtering Chamber for Ferroelectric Thin Film Deposition AU - Darren Pagan AU - Ian Mercer AU - Jon-Paul Maria AU - Kevin Dressler AU - Ric Wilburn AU - Susan E Trolier-Mckinstry AU - Stanislav Udovenko AU - Sarah Olandt PY - 2026 DO - 10.26207/vnh1-wf39 UR - https://doi.org/10.26207/vnh1-wf39 ER -
APA
Pagan, D., Mercer, I., Maria, J., Dressler, K., Wilburn, R., Trolier-Mckinstry, S. E., Udovenko, S., & Olandt, S. (2026). An Automated Magnetron Sputtering Chamber for Ferroelectric Thin Film Deposition. https://doi.org/10.26207/vnh1-wf39
Source records
- datacite · retrieved 2026-11-10T09:42:00.590Z