New Approach for Monitoring a Direct Laser Interference Patterning Process Using a Combination of an Infrared Camera and a Diffraction Measurement System

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DOI
10.2961/jlmn.2021.02.2009
Published
2021-10
Container
Journal of Laser Micro/Nanoengineering
Publisher
Japan Laser Processing Society
Open access
unknown

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BibTeX

@article{allodium:10.2961/jlmn.2021.02.2009,
  title = {New Approach for Monitoring a Direct Laser Interference Patterning Process Using a Combination of an Infrared Camera and a Diffraction Measurement System},
  year = {2021},
  journal = {Journal of Laser Micro/Nanoengineering},
  doi = {10.2961/jlmn.2021.02.2009},
  url = {https://doi.org/10.2961/jlmn.2021.02.2009}
}

RIS

TY  - JOUR
TI  - New Approach for Monitoring a Direct Laser Interference Patterning Process Using a Combination of an Infrared Camera and a Diffraction Measurement System
PY  - 2021
JO  - Journal of Laser Micro/Nanoengineering
DO  - 10.2961/jlmn.2021.02.2009
UR  - https://doi.org/10.2961/jlmn.2021.02.2009
ER  - 

APA

New Approach for Monitoring a Direct Laser Interference Patterning Process Using a Combination of an Infrared Camera and a Diffraction Measurement System. (2021). Journal of Laser Micro/Nanoengineering. https://doi.org/10.2961/jlmn.2021.02.2009

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