New Approach for Monitoring a Direct Laser Interference Patterning Process Using a Combination of an Infrared Camera and a Diffraction Measurement System
- DOI
- 10.2961/jlmn.2021.02.2009
- Published
- 2021-10
- Container
- Journal of Laser Micro/Nanoengineering
- Publisher
- Japan Laser Processing Society
- Open access
- unknown
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Cite this work
BibTeX
@article{allodium:10.2961/jlmn.2021.02.2009,
title = {New Approach for Monitoring a Direct Laser Interference Patterning Process Using a Combination of an Infrared Camera and a Diffraction Measurement System},
year = {2021},
journal = {Journal of Laser Micro/Nanoengineering},
doi = {10.2961/jlmn.2021.02.2009},
url = {https://doi.org/10.2961/jlmn.2021.02.2009}
}RIS
TY - JOUR TI - New Approach for Monitoring a Direct Laser Interference Patterning Process Using a Combination of an Infrared Camera and a Diffraction Measurement System PY - 2021 JO - Journal of Laser Micro/Nanoengineering DO - 10.2961/jlmn.2021.02.2009 UR - https://doi.org/10.2961/jlmn.2021.02.2009 ER -
APA
New Approach for Monitoring a Direct Laser Interference Patterning Process Using a Combination of an Infrared Camera and a Diffraction Measurement System. (2021). Journal of Laser Micro/Nanoengineering. https://doi.org/10.2961/jlmn.2021.02.2009
Source records
- crossref · retrieved 2026-09-25T14:18:55.453Z