Manufacturing Process and Characteristics of Silica Nanostructures for Anti-Reflection at 355 nm

Anne Gärtner, Mihai-George Mureșan, Christian Mühlig, Tobias Herffurth, Nadja Felde, Hanjörg Wagner, Ulrike Schulz, Astrid Bingel, Sven Schröder, Tomáš Mocek, Andreas Tünnermann

Open source

DOI
10.3390/coatings15050556
Published
2025-05-06
Container
Coatings
Publisher
MDPI AG
Open access
unknown

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BibTeX

@article{allodium:10.3390/coatings15050556,
  title = {Manufacturing Process and Characteristics of Silica Nanostructures for Anti-Reflection at 355 nm},
  author = {Anne Gärtner and Mihai-George Mureșan and Christian Mühlig and Tobias Herffurth and Nadja Felde and Hanjörg Wagner and Ulrike Schulz and Astrid Bingel and Sven Schröder and Tomáš Mocek and Andreas Tünnermann},
  year = {2025},
  journal = {Coatings},
  doi = {10.3390/coatings15050556},
  url = {https://doi.org/10.3390/coatings15050556}
}

RIS

TY  - JOUR
TI  - Manufacturing Process and Characteristics of Silica Nanostructures for Anti-Reflection at 355 nm
AU  - Anne Gärtner
AU  - Mihai-George Mureșan
AU  - Christian Mühlig
AU  - Tobias Herffurth
AU  - Nadja Felde
AU  - Hanjörg Wagner
AU  - Ulrike Schulz
AU  - Astrid Bingel
AU  - Sven Schröder
AU  - Tomáš Mocek
AU  - Andreas Tünnermann
PY  - 2025
JO  - Coatings
DO  - 10.3390/coatings15050556
UR  - https://doi.org/10.3390/coatings15050556
ER  - 

APA

Gärtner, A., Mureșan, M., Mühlig, C., Herffurth, T., Felde, N., Wagner, H., Schulz, U., Bingel, A., Schröder, S., Mocek, T., & Tünnermann, A. (2025). Manufacturing Process and Characteristics of Silica Nanostructures for Anti-Reflection at 355 nm. Coatings. https://doi.org/10.3390/coatings15050556

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