Surface Analysis of TMCTS-Based SiOC(H) Low-k Dielectrics in Post-Etch Strip of ACL Hardmask.

Park MK, Song WS, Kim MH, Hong SJ

DOI: 10.3390/ma14051144
Published: 2021 Feb 28
Container: Materials (Basel, Switzerland)
Publisher: Not recorded
Open access: yes

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Cite this work

BibTeX

@article{allodium:10.3390/ma14051144,
  title = {Surface Analysis of TMCTS-Based SiOC(H) Low-k Dielectrics in Post-Etch Strip of ACL Hardmask.},
  author = {Park MK and Song WS and Kim MH and Hong SJ},
  year = {2021},
  journal = {Materials (Basel, Switzerland)},
  doi = {10.3390/ma14051144},
  url = {https://doi.org/10.3390/ma14051144}
}

RIS

TY  - JOUR
TI  - Surface Analysis of TMCTS-Based SiOC(H) Low-k Dielectrics in Post-Etch Strip of ACL Hardmask.
AU  - Park MK
AU  - Song WS
AU  - Kim MH
AU  - Hong SJ
PY  - 2021
JO  - Materials (Basel, Switzerland)
DO  - 10.3390/ma14051144
UR  - https://doi.org/10.3390/ma14051144
ER  -

APA

MK, P., WS, S., MH, K., & SJ, H. (2021). Surface Analysis of TMCTS-Based SiOC(H) Low-k Dielectrics in Post-Etch Strip of ACL Hardmask.. Materials (Basel, Switzerland). https://doi.org/10.3390/ma14051144

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pubmed · retrieved 2026-09-26T07:34:00.728Z