Investigating the Behavior of Thin-Film Formation over Time as a Function of Precursor Concentration and Gas Residence Time in Nitrogen Dielectric Barrier Discharge.
- DOI
- 10.3390/ma17040875
- Published
- 2024 Feb 14
- Container
- Materials (Basel, Switzerland)
- Publisher
- Not recorded
- Open access
- yes
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BibTeX
@article{allodium:10.3390/ma17040875,
title = {Investigating the Behavior of Thin-Film Formation over Time as a Function of Precursor Concentration and Gas Residence Time in Nitrogen Dielectric Barrier Discharge.},
author = {Fotouhiardakani F and Destrieux A and Profili J and Laurent M and Ravichandran S and Dorairaju G and Laroche G},
year = {2024},
journal = {Materials (Basel, Switzerland)},
doi = {10.3390/ma17040875},
url = {https://doi.org/10.3390/ma17040875}
}RIS
TY - JOUR TI - Investigating the Behavior of Thin-Film Formation over Time as a Function of Precursor Concentration and Gas Residence Time in Nitrogen Dielectric Barrier Discharge. AU - Fotouhiardakani F AU - Destrieux A AU - Profili J AU - Laurent M AU - Ravichandran S AU - Dorairaju G AU - Laroche G PY - 2024 JO - Materials (Basel, Switzerland) DO - 10.3390/ma17040875 UR - https://doi.org/10.3390/ma17040875 ER -
APA
F, F., A, D., J, P., M, L., S, R., G, D., & G, L. (2024). Investigating the Behavior of Thin-Film Formation over Time as a Function of Precursor Concentration and Gas Residence Time in Nitrogen Dielectric Barrier Discharge.. Materials (Basel, Switzerland). https://doi.org/10.3390/ma17040875
Source records
- pubmed · retrieved 2026-09-26T22:02:09.954Z