Investigation of the Etching Resistance of Yttrium Oxyfluoride Coating Deposited via Atmospheric Plasma Spraying Against Cl2/O2 Plasma
- DOI
- 10.3390/ma18091903
- Published
- 2025-04-23
- Container
- Materials
- Publisher
- MDPI AG
- Open access
- unknown
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Cite this work
BibTeX
@article{allodium:10.3390/ma18091903,
title = {Investigation of the Etching Resistance of Yttrium Oxyfluoride Coating Deposited via Atmospheric Plasma Spraying Against Cl2/O2 Plasma},
author = {Zaifeng Tang and Yukun Lv and Kaiqu Ang and Bing Wang and Xiaojun Jiang and Yuwei Wang and Jin Xu and Hua Meng and Hongli Chen and Ying Shi and Linjun Wang},
year = {2025},
journal = {Materials},
doi = {10.3390/ma18091903},
url = {https://doi.org/10.3390/ma18091903}
}RIS
TY - JOUR TI - Investigation of the Etching Resistance of Yttrium Oxyfluoride Coating Deposited via Atmospheric Plasma Spraying Against Cl2/O2 Plasma AU - Zaifeng Tang AU - Yukun Lv AU - Kaiqu Ang AU - Bing Wang AU - Xiaojun Jiang AU - Yuwei Wang AU - Jin Xu AU - Hua Meng AU - Hongli Chen AU - Ying Shi AU - Linjun Wang PY - 2025 JO - Materials DO - 10.3390/ma18091903 UR - https://doi.org/10.3390/ma18091903 ER -
APA
Tang, Z., Lv, Y., Ang, K., Wang, B., Jiang, X., Wang, Y., Xu, J., Meng, H., Chen, H., Shi, Y., & Wang, L. (2025). Investigation of the Etching Resistance of Yttrium Oxyfluoride Coating Deposited via Atmospheric Plasma Spraying Against Cl2/O2 Plasma. Materials. https://doi.org/10.3390/ma18091903
Source records
- crossref · retrieved 2026-09-25T01:56:51.233Z