Silicon Oxycarbide Thin Films Produced by Hydrogen-Induced CVD Process from Cyclic Dioxa-Tetrasilacyclohexane.
- DOI
- 10.3390/ma18122911
- Published
- 2025 Jun 19
- Container
- Materials (Basel, Switzerland)
- Publisher
- Not recorded
- Open access
- yes
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Cite this work
BibTeX
@article{allodium:10.3390/ma18122911,
title = {Silicon Oxycarbide Thin Films Produced by Hydrogen-Induced CVD Process from Cyclic Dioxa-Tetrasilacyclohexane.},
author = {Walkiewicz-Pietrzykowska A and Jankowski K and Kurjata J and Dolot R and Brzozowski R and Zakrzewska J and Uznanski P},
year = {2025},
journal = {Materials (Basel, Switzerland)},
doi = {10.3390/ma18122911},
url = {https://doi.org/10.3390/ma18122911}
}RIS
TY - JOUR TI - Silicon Oxycarbide Thin Films Produced by Hydrogen-Induced CVD Process from Cyclic Dioxa-Tetrasilacyclohexane. AU - Walkiewicz-Pietrzykowska A AU - Jankowski K AU - Kurjata J AU - Dolot R AU - Brzozowski R AU - Zakrzewska J AU - Uznanski P PY - 2025 JO - Materials (Basel, Switzerland) DO - 10.3390/ma18122911 UR - https://doi.org/10.3390/ma18122911 ER -
APA
A, W., K, J., J, K., R, D., R, B., J, Z., & P, U. (2025). Silicon Oxycarbide Thin Films Produced by Hydrogen-Induced CVD Process from Cyclic Dioxa-Tetrasilacyclohexane.. Materials (Basel, Switzerland). https://doi.org/10.3390/ma18122911
Source records
- pubmed · retrieved 2026-09-26T00:32:52.131Z