Effect of Heating/Cooling Rate and Temperature on Microstructure and Electrical Properties of Sputter-Deposited PZT Thin Films Crystallized by Conventional Furnace Annealing.
- DOI
- 10.3390/ma19091782
- Published
- 2026 Apr 28
- Container
- Materials (Basel, Switzerland)
- Publisher
- Not recorded
- Open access
- yes
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Cite this work
BibTeX
@article{allodium:10.3390/ma19091782,
title = {Effect of Heating/Cooling Rate and Temperature on Microstructure and Electrical Properties of Sputter-Deposited PZT Thin Films Crystallized by Conventional Furnace Annealing.},
author = {Wich M and Helmerich J and Ott P and Ambacher O and Rupitsch SJ},
year = {2026},
journal = {Materials (Basel, Switzerland)},
doi = {10.3390/ma19091782},
url = {https://doi.org/10.3390/ma19091782}
}RIS
TY - JOUR TI - Effect of Heating/Cooling Rate and Temperature on Microstructure and Electrical Properties of Sputter-Deposited PZT Thin Films Crystallized by Conventional Furnace Annealing. AU - Wich M AU - Helmerich J AU - Ott P AU - Ambacher O AU - Rupitsch SJ PY - 2026 JO - Materials (Basel, Switzerland) DO - 10.3390/ma19091782 UR - https://doi.org/10.3390/ma19091782 ER -
APA
M, W., J, H., P, O., O, A., & SJ, R. (2026). Effect of Heating/Cooling Rate and Temperature on Microstructure and Electrical Properties of Sputter-Deposited PZT Thin Films Crystallized by Conventional Furnace Annealing.. Materials (Basel, Switzerland). https://doi.org/10.3390/ma19091782
Source records
- pubmed · retrieved 2026-09-25T18:26:17.038Z