Review of the Gate Structure for Normally Off p-GaN High-Electron-Mobility Transistors Towards High Performances

Taofei Pu, Xiaobo Li, Liuan Li, Jin-Ping Ao

Open source

DOI
10.3390/ma19112205
Published
2026-05-23
Container
Materials
Publisher
MDPI AG
Open access
unknown

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BibTeX

@article{allodium:10.3390/ma19112205,
  title = {Review of the Gate Structure for Normally Off p-GaN High-Electron-Mobility Transistors Towards High Performances},
  author = {Taofei Pu and Xiaobo Li and Liuan Li and Jin-Ping Ao},
  year = {2026},
  journal = {Materials},
  doi = {10.3390/ma19112205},
  url = {https://doi.org/10.3390/ma19112205}
}

RIS

TY  - JOUR
TI  - Review of the Gate Structure for Normally Off p-GaN High-Electron-Mobility Transistors Towards High Performances
AU  - Taofei Pu
AU  - Xiaobo Li
AU  - Liuan Li
AU  - Jin-Ping Ao
PY  - 2026
JO  - Materials
DO  - 10.3390/ma19112205
UR  - https://doi.org/10.3390/ma19112205
ER  - 

APA

Pu, T., Li, X., Li, L., & Ao, J. (2026). Review of the Gate Structure for Normally Off p-GaN High-Electron-Mobility Transistors Towards High Performances. Materials. https://doi.org/10.3390/ma19112205

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