Influence of RF Sputtering Pressure and Power on the Microstructure of Sb Thin Films.

Uc-Canche S, Camacho-Espinosa E, Loeza-Poot M, Mis-Fernández R, Flores E

DOI: 10.3390/ma19143119
Published: 2026 Jul 21
Container: Materials (Basel, Switzerland)
Publisher: Not recorded
Open access: yes

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Cite this work

BibTeX

@article{allodium:10.3390/ma19143119,
  title = {Influence of RF Sputtering Pressure and Power on the Microstructure of Sb Thin Films.},
  author = {Uc-Canche S and Camacho-Espinosa E and Loeza-Poot M and Mis-Fernández R and Flores E},
  year = {2026},
  journal = {Materials (Basel, Switzerland)},
  doi = {10.3390/ma19143119},
  url = {https://doi.org/10.3390/ma19143119}
}

RIS

TY  - JOUR
TI  - Influence of RF Sputtering Pressure and Power on the Microstructure of Sb Thin Films.
AU  - Uc-Canche S
AU  - Camacho-Espinosa E
AU  - Loeza-Poot M
AU  - Mis-Fernández R
AU  - Flores E
PY  - 2026
JO  - Materials (Basel, Switzerland)
DO  - 10.3390/ma19143119
UR  - https://doi.org/10.3390/ma19143119
ER  -

APA

S, U., E, C., M, L., R, M., & E, F. (2026). Influence of RF Sputtering Pressure and Power on the Microstructure of Sb Thin Films.. Materials (Basel, Switzerland). https://doi.org/10.3390/ma19143119

Source records

pubmed · retrieved 2026-09-26T04:12:37.716Z