Material Removal Mechanism and Performance Evaluation of Focused Ultrasonic-Assisted Abrasive Waterjet Polishing (FUAP) of Monocrystalline Silicon.

Ren K, Yuan J, Li H, Miao Q, Wang Z, Liu Q, Liu X

DOI: 10.3390/ma19153339
Published: 2026 Aug 5
Container: Materials (Basel, Switzerland)
Publisher: Not recorded
Open access: yes

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Cite this work

BibTeX

@article{allodium:10.3390/ma19153339,
  title = {Material Removal Mechanism and Performance Evaluation of Focused Ultrasonic-Assisted Abrasive Waterjet Polishing (FUAP) of Monocrystalline Silicon.},
  author = {Ren K and Yuan J and Li H and Miao Q and Wang Z and Liu Q and Liu X},
  year = {2026},
  journal = {Materials (Basel, Switzerland)},
  doi = {10.3390/ma19153339},
  url = {https://doi.org/10.3390/ma19153339}
}

RIS

TY  - JOUR
TI  - Material Removal Mechanism and Performance Evaluation of Focused Ultrasonic-Assisted Abrasive Waterjet Polishing (FUAP) of Monocrystalline Silicon.
AU  - Ren K
AU  - Yuan J
AU  - Li H
AU  - Miao Q
AU  - Wang Z
AU  - Liu Q
AU  - Liu X
PY  - 2026
JO  - Materials (Basel, Switzerland)
DO  - 10.3390/ma19153339
UR  - https://doi.org/10.3390/ma19153339
ER  -

APA

K, R., J, Y., H, L., Q, M., Z, W., Q, L., & X, L. (2026). Material Removal Mechanism and Performance Evaluation of Focused Ultrasonic-Assisted Abrasive Waterjet Polishing (FUAP) of Monocrystalline Silicon.. Materials (Basel, Switzerland). https://doi.org/10.3390/ma19153339

Source records

pubmed · retrieved 2026-09-25T11:24:16.667Z
europe-pmc · retrieved 2026-09-25T11:24:16.682Z