Evolution of the Shadow Effect with Film Thickness and Substrate Conductivity on a Hemispherical Workpiece during Magnetron Sputtering

Huaiyuan Liu, Donglin Ma, Yantao Li, Lina You, Yongxiang Leng

Open source

DOI: 10.3390/met13010165
Published: 01
Container: Metals
Publisher: Not recorded
Open access: yes

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Cite this work

BibTeX

@article{allodium:10.3390/met13010165,
  title = {Evolution of the Shadow Effect with Film Thickness and Substrate Conductivity on a Hemispherical Workpiece during Magnetron Sputtering},
  author = {Huaiyuan Liu and Donglin Ma and Yantao Li and Lina You and Yongxiang Leng},
  year = {2023},
  journal = {Metals},
  doi = {10.3390/met13010165},
  url = {https://doi.org/10.3390/met13010165}
}

RIS

TY  - JOUR
TI  - Evolution of the Shadow Effect with Film Thickness and Substrate Conductivity on a Hemispherical Workpiece during Magnetron Sputtering
AU  - Huaiyuan Liu
AU  - Donglin Ma
AU  - Yantao Li
AU  - Lina You
AU  - Yongxiang Leng
PY  - 2023
JO  - Metals
DO  - 10.3390/met13010165
UR  - https://doi.org/10.3390/met13010165
ER  -

APA

Liu, H., Ma, D., Li, Y., You, L., & Leng, Y. (2023). Evolution of the Shadow Effect with Film Thickness and Substrate Conductivity on a Hemispherical Workpiece during Magnetron Sputtering. Metals. https://doi.org/10.3390/met13010165

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doaj · retrieved 2026-11-10T08:14:23.929Z