High Rate Deposition of Piezoelectric AlScN Films by Reactive Magnetron Sputtering from AlSc Alloy Targets on Large Area.

Barth S, Schreiber T, Cornelius S, Zywitzki O, Modes T, Bartzsch H

DOI: 10.3390/mi13101561
Published: 2022 Sep 21
Container: Micromachines
Publisher: Not recorded
Open access: yes

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Cite this work

BibTeX

@article{allodium:10.3390/mi13101561,
  title = {High Rate Deposition of Piezoelectric AlScN Films by Reactive Magnetron Sputtering from AlSc Alloy Targets on Large Area.},
  author = {Barth S and Schreiber T and Cornelius S and Zywitzki O and Modes T and Bartzsch H},
  year = {2022},
  journal = {Micromachines},
  doi = {10.3390/mi13101561},
  url = {https://doi.org/10.3390/mi13101561}
}

RIS

TY  - JOUR
TI  - High Rate Deposition of Piezoelectric AlScN Films by Reactive Magnetron Sputtering from AlSc Alloy Targets on Large Area.
AU  - Barth S
AU  - Schreiber T
AU  - Cornelius S
AU  - Zywitzki O
AU  - Modes T
AU  - Bartzsch H
PY  - 2022
JO  - Micromachines
DO  - 10.3390/mi13101561
UR  - https://doi.org/10.3390/mi13101561
ER  -

APA

S, B., T, S., S, C., O, Z., T, M., & H, B. (2022). High Rate Deposition of Piezoelectric AlScN Films by Reactive Magnetron Sputtering from AlSc Alloy Targets on Large Area.. Micromachines. https://doi.org/10.3390/mi13101561

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pubmed · retrieved 2026-09-26T18:14:03.921Z