Reliability Study of Metal-Oxide Semiconductors in Integrated Circuits.

Malozyomov BV, Martyushev NV, Bryukhanova NN, Kondratiev VV, Kononenko RV, Pavlov PP, Romanova VV, Karlina YI

Open source

DOI: 10.3390/mi15050561
Published: 2024 Apr 24
Container: Micromachines
Publisher: Not recorded
Open access: yes

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Cite this work

BibTeX

@article{allodium:10.3390/mi15050561,
  title = {Reliability Study of Metal-Oxide Semiconductors in Integrated Circuits.},
  author = {Malozyomov BV and Martyushev NV and Bryukhanova NN and Kondratiev VV and Kononenko RV and Pavlov PP and Romanova VV and Karlina YI},
  year = {2024},
  journal = {Micromachines},
  doi = {10.3390/mi15050561},
  url = {https://doi.org/10.3390/mi15050561}
}

RIS

TY  - JOUR
TI  - Reliability Study of Metal-Oxide Semiconductors in Integrated Circuits.
AU  - Malozyomov BV
AU  - Martyushev NV
AU  - Bryukhanova NN
AU  - Kondratiev VV
AU  - Kononenko RV
AU  - Pavlov PP
AU  - Romanova VV
AU  - Karlina YI
PY  - 2024
JO  - Micromachines
DO  - 10.3390/mi15050561
UR  - https://doi.org/10.3390/mi15050561
ER  -

APA

BV, M., NV, M., NN, B., VV, K., RV, K., PP, P., VV, R., & YI, K. (2024). Reliability Study of Metal-Oxide Semiconductors in Integrated Circuits.. Micromachines. https://doi.org/10.3390/mi15050561

Source records

pubmed · retrieved 2026-11-11T00:09:14.644Z
europe-pmc · retrieved 2026-11-11T00:09:14.614Z
doaj · retrieved 2026-11-11T00:09:14.596Z