Enhancing Confidence and Interpretability of a CNN-Based Wafer Defect Classification Model Using Temperature Scaling and LIME.

Lee J, Ju Y, Lim J, Hong S, Baek SW, Lee J

Open source

DOI
10.3390/mi16091057
Published
2025 Sep 17
Container
Micromachines
Publisher
Not recorded
Open access
yes

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limited evidence Score 45/100 under policy 1.0.0. This is a metadata assessment, not a judgment of the paper's conclusions.

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BibTeX

@article{allodium:10.3390/mi16091057,
  title = {Enhancing Confidence and Interpretability of a CNN-Based Wafer Defect Classification Model Using Temperature Scaling and LIME.},
  author = {Lee J and Ju Y and Lim J and Hong S and Baek SW and Lee J},
  year = {2025},
  journal = {Micromachines},
  doi = {10.3390/mi16091057},
  url = {https://doi.org/10.3390/mi16091057}
}

RIS

TY  - JOUR
TI  - Enhancing Confidence and Interpretability of a CNN-Based Wafer Defect Classification Model Using Temperature Scaling and LIME.
AU  - Lee J
AU  - Ju Y
AU  - Lim J
AU  - Hong S
AU  - Baek SW
AU  - Lee J
PY  - 2025
JO  - Micromachines
DO  - 10.3390/mi16091057
UR  - https://doi.org/10.3390/mi16091057
ER  - 

APA

J, L., Y, J., J, L., S, H., SW, B., & J, L. (2025). Enhancing Confidence and Interpretability of a CNN-Based Wafer Defect Classification Model Using Temperature Scaling and LIME.. Micromachines. https://doi.org/10.3390/mi16091057

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