Comprehensive Investigation of the Commercial ELP-20 Electron-Beam Lithography Resist
- DOI
- 10.3390/mi17010004
- Published
- 2025-12-19
- Container
- Micromachines
- Publisher
- MDPI AG
- Open access
- unknown
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Cite this work
BibTeX
@article{allodium:10.3390/mi17010004,
title = {Comprehensive Investigation of the Commercial ELP-20 Electron-Beam Lithography Resist},
author = {Meruert Qairat and Aliya Alzhanova and Mustakhim Pshikov and Renata Nemkayeva and Nazim Guseinov and Sergey Zaitsev and Mukhit Muratov},
year = {2025},
journal = {Micromachines},
doi = {10.3390/mi17010004},
url = {https://doi.org/10.3390/mi17010004}
}RIS
TY - JOUR TI - Comprehensive Investigation of the Commercial ELP-20 Electron-Beam Lithography Resist AU - Meruert Qairat AU - Aliya Alzhanova AU - Mustakhim Pshikov AU - Renata Nemkayeva AU - Nazim Guseinov AU - Sergey Zaitsev AU - Mukhit Muratov PY - 2025 JO - Micromachines DO - 10.3390/mi17010004 UR - https://doi.org/10.3390/mi17010004 ER -
APA
Qairat, M., Alzhanova, A., Pshikov, M., Nemkayeva, R., Guseinov, N., Zaitsev, S., & Muratov, M. (2025). Comprehensive Investigation of the Commercial ELP-20 Electron-Beam Lithography Resist. Micromachines. https://doi.org/10.3390/mi17010004
Source records
- crossref · retrieved 2026-09-26T02:08:24.889Z