The Evolution of Lithography: From Resolution Scaling to Manufacturing Constraints.

Chae H, Park H, Kang DJ

DOI: 10.3390/mi17020261
Published: 2026 Feb 18
Container: Micromachines
Publisher: Not recorded
Open access: yes

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Cite this work

BibTeX

@article{allodium:10.3390/mi17020261,
  title = {The Evolution of Lithography: From Resolution Scaling to Manufacturing Constraints.},
  author = {Chae H and Park H and Kang DJ},
  year = {2026},
  journal = {Micromachines},
  doi = {10.3390/mi17020261},
  url = {https://doi.org/10.3390/mi17020261}
}

RIS

TY  - JOUR
TI  - The Evolution of Lithography: From Resolution Scaling to Manufacturing Constraints.
AU  - Chae H
AU  - Park H
AU  - Kang DJ
PY  - 2026
JO  - Micromachines
DO  - 10.3390/mi17020261
UR  - https://doi.org/10.3390/mi17020261
ER  -

APA

H, C., H, P., & DJ, K. (2026). The Evolution of Lithography: From Resolution Scaling to Manufacturing Constraints.. Micromachines. https://doi.org/10.3390/mi17020261

Source records

pubmed · retrieved 2026-11-10T16:43:53.504Z