A Backside-Electrode-Free Lateral 4H-SiC JFET with Three-Terminal Dual-Gate Design for Stable DC Operation at 500 °C.

Tang Y, Luo Q, Zhu J, Zhang H, Chang Y, Liang H

Open source

DOI
10.3390/mi17060642
Published
2026 May 22
Container
Micromachines
Publisher
Not recorded
Open access
yes

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BibTeX

@article{allodium:10.3390/mi17060642,
  title = {A Backside-Electrode-Free Lateral 4H-SiC JFET with Three-Terminal Dual-Gate Design for Stable DC Operation at 500 °C.},
  author = {Tang Y and Luo Q and Zhu J and Zhang H and Chang Y and Liang H},
  year = {2026},
  journal = {Micromachines},
  doi = {10.3390/mi17060642},
  url = {https://doi.org/10.3390/mi17060642}
}

RIS

TY  - JOUR
TI  - A Backside-Electrode-Free Lateral 4H-SiC JFET with Three-Terminal Dual-Gate Design for Stable DC Operation at 500 °C.
AU  - Tang Y
AU  - Luo Q
AU  - Zhu J
AU  - Zhang H
AU  - Chang Y
AU  - Liang H
PY  - 2026
JO  - Micromachines
DO  - 10.3390/mi17060642
UR  - https://doi.org/10.3390/mi17060642
ER  - 

APA

Y, T., Q, L., J, Z., H, Z., Y, C., & H, L. (2026). A Backside-Electrode-Free Lateral 4H-SiC JFET with Three-Terminal Dual-Gate Design for Stable DC Operation at 500 °C.. Micromachines. https://doi.org/10.3390/mi17060642

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