Mechanisms of Film-Formation-Related Defects in EUV Photoresists for Sub-3 nm Nodes and Synergistic Materials–Process–Intelligence Co-Optimization
- DOI
- 10.3390/mi17070864
- Published
- 2026-07-21
- Container
- Micromachines
- Publisher
- MDPI AG
- Open access
- unknown
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Cite this work
BibTeX
@article{allodium:10.3390/mi17070864,
title = {Mechanisms of Film-Formation-Related Defects in EUV Photoresists for Sub-3 nm Nodes and Synergistic Materials–Process–Intelligence Co-Optimization},
author = {Junlin Wu and Yanqing Luo and Junzhe Hu and Shirong Li and Sen Cai and Tiedong Cheng and Ping Zhang and Pei Li and Shengkun Jiang and Ziqiang Liu and Guitai Wu and Sergey Mikhailovich Kopytov and Jin Yang},
year = {2026},
journal = {Micromachines},
doi = {10.3390/mi17070864},
url = {https://doi.org/10.3390/mi17070864}
}RIS
TY - JOUR TI - Mechanisms of Film-Formation-Related Defects in EUV Photoresists for Sub-3 nm Nodes and Synergistic Materials–Process–Intelligence Co-Optimization AU - Junlin Wu AU - Yanqing Luo AU - Junzhe Hu AU - Shirong Li AU - Sen Cai AU - Tiedong Cheng AU - Ping Zhang AU - Pei Li AU - Shengkun Jiang AU - Ziqiang Liu AU - Guitai Wu AU - Sergey Mikhailovich Kopytov AU - Jin Yang PY - 2026 JO - Micromachines DO - 10.3390/mi17070864 UR - https://doi.org/10.3390/mi17070864 ER -
APA
Wu, J., Luo, Y., Hu, J., Li, S., Cai, S., Cheng, T., Zhang, P., Li, P., Jiang, S., Liu, Z., Wu, G., Kopytov, S. M., & Yang, J. (2026). Mechanisms of Film-Formation-Related Defects in EUV Photoresists for Sub-3 nm Nodes and Synergistic Materials–Process–Intelligence Co-Optimization. Micromachines. https://doi.org/10.3390/mi17070864
Source records
- crossref · retrieved 2026-09-25T04:50:12.353Z