High-Sensitivity AlGaN/GaN HFET Implantable Neural Probe Without Gate Control Enabled by Photoelectrochemical Etching

Yanyuan Ding, Xin Cao, Yang Li, Xien Yang, Ye Wen, Xiaodong Li, Xilei Huang, Zeyi Li, Jiefeng Weng, Baijun Zhang

Open source

DOI
10.3390/mi17080956
Published
2026-08-12
Container
Micromachines
Publisher
MDPI AG
Open access
unknown

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BibTeX

@article{allodium:10.3390/mi17080956,
  title = {High-Sensitivity AlGaN/GaN HFET Implantable Neural Probe Without Gate Control Enabled by Photoelectrochemical Etching},
  author = {Yanyuan Ding and Xin Cao and Yang Li and Xien Yang and Ye Wen and Xiaodong Li and Xilei Huang and Zeyi Li and Jiefeng Weng and Baijun Zhang},
  year = {2026},
  journal = {Micromachines},
  doi = {10.3390/mi17080956},
  url = {https://doi.org/10.3390/mi17080956}
}

RIS

TY  - JOUR
TI  - High-Sensitivity AlGaN/GaN HFET Implantable Neural Probe Without Gate Control Enabled by Photoelectrochemical Etching
AU  - Yanyuan Ding
AU  - Xin Cao
AU  - Yang Li
AU  - Xien Yang
AU  - Ye Wen
AU  - Xiaodong Li
AU  - Xilei Huang
AU  - Zeyi Li
AU  - Jiefeng Weng
AU  - Baijun Zhang
PY  - 2026
JO  - Micromachines
DO  - 10.3390/mi17080956
UR  - https://doi.org/10.3390/mi17080956
ER  - 

APA

Ding, Y., Cao, X., Li, Y., Yang, X., Wen, Y., Li, X., Huang, X., Li, Z., Weng, J., & Zhang, B. (2026). High-Sensitivity AlGaN/GaN HFET Implantable Neural Probe Without Gate Control Enabled by Photoelectrochemical Etching. Micromachines. https://doi.org/10.3390/mi17080956

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