RFEA-Derived Ion-Energy Descriptors for Preliminary Process-Window Evaluation in Dual-Beam Soft Plasma Etching of Organic Semiconductor Films

Rui Gao, Mengna Dai, Xin Zou, Yuheng Wang

Open source

DOI: 10.3390/mi17101139
Published: 2026-09-30
Container: Micromachines
Publisher: MDPI AG
Open access: unknown

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Cite this work

BibTeX

@article{allodium:10.3390/mi17101139,
  title = {RFEA-Derived Ion-Energy Descriptors for Preliminary Process-Window Evaluation in Dual-Beam Soft Plasma Etching of Organic Semiconductor Films},
  author = {Rui Gao and Mengna Dai and Xin Zou and Yuheng Wang},
  year = {2026},
  journal = {Micromachines},
  doi = {10.3390/mi17101139},
  url = {https://doi.org/10.3390/mi17101139}
}

RIS

TY  - JOUR
TI  - RFEA-Derived Ion-Energy Descriptors for Preliminary Process-Window Evaluation in Dual-Beam Soft Plasma Etching of Organic Semiconductor Films
AU  - Rui Gao
AU  - Mengna Dai
AU  - Xin Zou
AU  - Yuheng Wang
PY  - 2026
JO  - Micromachines
DO  - 10.3390/mi17101139
UR  - https://doi.org/10.3390/mi17101139
ER  -

APA

Gao, R., Dai, M., Zou, X., & Wang, Y. (2026). RFEA-Derived Ion-Energy Descriptors for Preliminary Process-Window Evaluation in Dual-Beam Soft Plasma Etching of Organic Semiconductor Films. Micromachines. https://doi.org/10.3390/mi17101139

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crossref · retrieved 2026-11-09T20:23:23.441Z